发明名称 MASK AND MANUFACTURING METHOD OF SUBSTRATE USING THE SAME
摘要 A mask and a method for manufacturing a substrate using the same are provided to suppress a gap from being formed between a mask and a substrate by improving conformity with respect to a substrate of a mask in an edge of the substrate. A mask includes a mask pattern, a first region(101), and a second region(102). The mask pattern has a plurality of holes formed corresponding to a plurality of electrodes. The first region encloses the mask pattern and has a first thickness. The second region encloses the first region. A rear surface(90b) of a corresponding mask is recessed so that the second region is thinner than the first region. When a substrate(110) is positioned to meet the corresponding mask to correspond an electrode pattern of the substrate to a mask pattern of the corresponding mask, a boundary between the first region and the second region is positioned an inner side of an edge(113) of the substrate, and the second region extends to an outer side of the edge of the substrate.
申请公布号 KR20080093378(A) 申请公布日期 2008.10.21
申请号 KR20080034625 申请日期 2008.04.15
申请人 ATHLETE FA CORPORATION 发明人 NEBASHI TORU;KAWAKAMI SHIGEAKI;YAZAWA ICHIRO;ASANO KUNIKAZU
分类号 H01L21/60;H01L23/48 主分类号 H01L21/60
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