发明名称 Gate layer diode method and apparatus
摘要 Method, apparatus, and article of manufacture for a diode defined by a portion of a gate layer of an integrated circuit. Illustrative, non-limiting embodiments of the invention are provided, including a temperature compensated DRAM, a temperature compensated CPU, a temperature compensated logic circuit and other on-chip temperature sensor applications.
申请公布号 US7439591(B2) 申请公布日期 2008.10.21
申请号 US20040958464 申请日期 2004.10.05
申请人 INFINEON TECHNOLOGIES AG 发明人 KANG WOO-TAG
分类号 H01L23/62;H01L27/14 主分类号 H01L23/62
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