Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same

摘要

A salt represented by the formula (I): wherein X represents a C1-C12 divalent linear or branched chain hydrocarbon group, Y represents a C1-C30 hydrocarbon group which may be substituted with at least one substituent, and at least one -CH₂- in the C1-C30 hydrocarbon group may be substituted with -O- or -CO-, Q¹ and Q² each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A⁺ represents an organic counter ion. The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).