发明名称 Laser plasma spectroscopy apparatus and method for in situ depth profiling
摘要 An in-situ laser plasma spectroscopy (LPS) system for automated near real-time elemental depth profiling of a target including: an optical source configured to generate an optical beam, wherein the optical beam is pulsed; an optical probe system configured to deliver the optical beam from the optical source to a surface of a target to generate an ablation plasma; a time resolved spectral detection system configured to generate time resolved spectral data from emission signals from the ablation plasma; and a data acquisition and processing system configured to acquire the time resolved spectral data to determine, in combination with predetermined calibration data, an absolute elemental concentration as a function of depth in near real-time.
申请公布号 US7440097(B2) 申请公布日期 2008.10.21
申请号 US20060426708 申请日期 2006.06.27
申请人 GENERAL ELECTRIC COMPANY 发明人 BENICEWICZ PAMELA KING;FOMITCHOV PAVEL ALEXEYEVICH;ROZIER ELENA;VIERTL JOHN RUEDIGER MADER;SCHUMAKER TYMM BRADNER
分类号 G01J3/443;G01B11/06;G01B11/22;G01J3/30;G01N21/63 主分类号 G01J3/443
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