TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION

摘要

Disclosed are (1) a polymer compound for photoresist compositions which is high in storage stability and small in swelling during development; (2) a compound which is a raw material for such a polymer compound; and (3) a photoresist composition containing such a polymer compound and improved in LWR. Specifically disclosed is [1] a tertiary alcohol derivative represented by the general formula (1) below. [Chemical formula 1] (1) (In the formula, R1 represents a linear alkyl group having 1-6 carbon atoms, a branched alkyl group having 3-6 carbon atoms or a cyclic alkyl group having 3-6 carbon atoms; R2 represents a hydrogen atom or a methyl group; W represents a linear alkylene group having 1-10 carbon atoms, a branched alkylene group having 3-10 carbon atoms or a cyclic alkylene group having 3-10 carbon atoms; n represents 0 or 1; and p represents 1 or 2.)