| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of cleaning a powdery source scheme, which prevents particles from flowing out from a container or an introducing pipe in film forming processing. SOLUTION: A substrate processing system 10 is provided with a powdery source supply scheme 12 and a film forming processing device 11. The powdery source supply scheme 12 has: an ampule 14 for storing a powdery source 13 (tungsten carbonyl); a carrier gas supply device 16 for supplying a carrier gas into the ampule 14; a powdery source introducing pipe 17 for connecting the ampule 14 to a film formation processing device 11; a purge pipe 19 branched from the powdery source introducing pipe 17; and an opening/switching valve 22 for opening/switching the powdery source introducing pipe 17. Prior to the film forming processing, when the opening/closing valve 22 is opened to exhaust the purge pipe 19, the carrier gas supply device 16 supplies a carrier gas so that the viscosity of on the carrier gas becomes larger than the viscosity of a carrier gas in film forming processing. COPYRIGHT: (C)2009,JPO&INPIT
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