| 摘要 |
PROBLEM TO BE SOLVED: To accurately measure the concentration of a resist liquid prepared by mixing a resist source liquid with a solvent. SOLUTION: The device 100 for measuring resist concentration is equipped with a resist source liquid tank 101, a solvent tank 102, and a marker material tank 103. A resist source liquid and a solvent supplied from the respective tanks and a marker material solution to be added in a predetermined ratio to the concentration of the resist source liquid are mixed in a mixing block 106. The marker material has maximum absorbance to light at a wavelength of 600 nm to 900 nm, and fixed absorbance of the marker material only can be measured by irradiating the resist liquid with light at a wavelength of 600 nm to 900 nm by an absorbance meter 108. By computing the concentration of the marker material, the concentration of the resist liquid can be accurately measured. COPYRIGHT: (C)2009,JPO&INPIT |
