发明名称 |
NOVEL SULFUR-CONTAINING AND ETHYLENICALLY UNSATURATED GROUP-CONTAINING COMPOUND, RADIATION-CURABLE COMPOSITION, AND CURED MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-curable composition which can be suitably used for producing a cured material capable of having a high refractive index and a high Abbe number. SOLUTION: There are provided a sulfur-containing and ethylenically unsaturated group-containing compound (A) prepared by reacting a sulfur-containing compound represented by formula (1) with a compound having an ethylenically unsaturated group, a radiation-curable composition containing compound (A) and a cured material. Also provided are a radiation-curable composition comprising the compound (A) and a photopolymerization initiator and a radiation-curable composition comprising a compound which is other than the compound (A) and has an alicyclic structure and an ethylenically unsaturated group. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2008248172(A) |
申请公布日期 |
2008.10.16 |
申请号 |
JP20070093285 |
申请日期 |
2007.03.30 |
申请人 |
JSR CORP;TOKYO INSTITUTE OF TECHNOLOGY |
发明人 |
OKUTSU RIE;RYU KANETAKE;SHIBAZAKI YUJI;ANDO SHINJI;UEDA MITSURU;SUGAWARA SHUICHI;KURIYAMA KEISUKE;ERIYAMA YUUICHI;TAKASE HIDEAKI |
分类号 |
C08F20/38;C07D339/06 |
主分类号 |
C08F20/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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