Method of manufacturing a coaxial trace in a surrounding material, coaxial trace formed thereby, and semiconducting material containing same

摘要

A method of manufacturing a coaxial trace ( 100 ) within a surrounding material ( 190 ) includes: providing a first substrate ( 191, 410 ) and a second substrate ( 192, 1010 ) composed of the surrounding material; forming a first portion ( 101, 601 ) of the coaxial trace in the first substrate; forming a second portion ( 102, 1001 ) of the coaxial trace in the second substrate; aligning the first portion of the coaxial trace with the second portion of the coaxial trace; and bonding the first portion of the coaxial trace to the second portion of the coaxial trace.