发明名称 RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
摘要 The invention relates to a radiation system for generating electromagnetic radiation. The radiation system includes a pair of electrodes (5) constructed and arranged to generate plasma of a first substance and a pinch (10) in the plasma. The radiation system also includes a plasma recombination surface (13) that is arranged proximate to the pinch, and is configured to neutralize a plurality of plasma particles.
申请公布号 WO2008072962(A3) 申请公布日期 2008.10.16
申请号 WO2007NL50645 申请日期 2007.12.13
申请人 ASML NETHERLANDS B.V.;VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS;BANINE, VADIM YEVGENYEVICH;IVANOV, VLADIMIR VITALEVITCH;KOSHELEV, KONSTANTIN NIKOLAEVITCH;KLUNDER, DERK JAN WILFRED 发明人 VAN HERPEN, MAARTEN MARINUS JOHANNES WILHELMUS;BANINE, VADIM YEVGENYEVICH;IVANOV, VLADIMIR VITALEVITCH;KOSHELEV, KONSTANTIN NIKOLAEVITCH;KLUNDER, DERK JAN WILFRED
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
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