| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of deflecting a collimating mirror in an illumination optical system of an exposure device which can make a collimating mirror light in weight, by thinning the thickness of the collimating mirror, even if the extent of one edge of a rectangle of the collimating mirror becomes several thousands of millimeters, adequately deflects the collimating mirror, with the assumption on the relation between the thickness of the collimating mirror and the length of the edge, and permits high-accuracy exposure that causes less distortion aberrations, and to provide an illumination optical system for an exposure device obtained by the deflection method of the collimating mirror. SOLUTION: In the method of deflecting the collimating mirror in the illumination optical system of the exposure device, the luminous flux of exposure light rays from an illumination light source is made into parallel luminous flux by the deflected collimating mirror, and a pattern of a mask is transferred to an object to be transferred by the exposure light rays. The collimating mirror is deflected mechanically on the assumption of the relation between the thickness of the collimating mirror, and the length of the edge and the distortion aberrations of the parallel luminous flux are corrected. For example, assuming the relation between the thickness of the collimating mirror and the length of the edge, the collimating mirror is pressed and deflected upward or downward, with respect to the surface of the collimating mirror and is deformed to correct the distortion aberrations of the parallel luminous flux. COPYRIGHT: (C)2009,JPO&INPIT |
