| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing titania-silica glass that has no minute bubble remaining therein, has high light transmittance and can be suitably used as an optical member such as a photomask or a mirror material in EUV lithography. <P>SOLUTION: The titania-silica glass is manufactured through steps of: heat treating titania-silica porous soot containing titania by 0.1 to 10 wt.% to obtain a titania-silica calcined body; subjecting the titania-silica calcined body to a vitrification process in an atmosphere of reduced pressure of 10 Torr or less at 1,700 to 1,800°C, using a carbon mold under 0.1 to 1 MPa pressure to obtain a titania-silica glass body; and annealing the titania-silica glass body in an atmospheric environment or an environment containing oxygen by 2 to 100 vol%, at 800 to 1,200°C. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
