| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma processor which reduces a foreign mater and contaminant generated from an inner wall of a processing chamber and controls a plasma distribution. SOLUTION: In the plasma processor, a sample placed on a sample tray 109 disposed inside a processing chamber 100 is processed by use of a plasma produced in the processing chamber 100. A quartz cover 141 containing a conductive material 401 is installed inside an inner wall member 116. COPYRIGHT: (C)2009,JPO&INPIT
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