FOCUS RING AND SHIELD RING FOR PLASMA ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a focus ring and a shield ring for in plasma etching, which hardly wear to cause steps. SOLUTION: The focus ring 17 formed of prismatic silicon is characterized in that a prismatic crystal 12 of the focus ring 17 grows in the radial direction of the focus ring 17. COPYRIGHT: (C)2009,JPO&INPIT