发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of excellently separately collecting a plurality of kinds of treatment liquids different from one another in applying predetermined wet treatment to the substrate by sequentially supplying the plurality of kinds of treatment liquids. SOLUTION: The plurality of kinds of treatment liquids different from one another are sequentially supplied to a gap space S1 for disposing the substrate W to apply wet treatment to the substrate W for each treatment liquid. Treatment liquids are sequentially discharged from a communicating portion 124, and in this case, a treatment unit 1 and a liquid collecting unit 2 relatively move, so that liquid collecting tanks 21-24 are selectively disposed at collecting positions each corresponding to the kind of each of the treatment liquids to be discharged from the communicating portion 124. Here, the liquid collecting unit 2 is disposed on the lower side of the treatment unit 1 separately from the treatment unit 1, and the treatment liquids are discharged from the communicating portion 124 of the treatment unit 1 downward in a vertical direction to the lower side of the gap space S1. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008251584(A) 申请公布日期 2008.10.16
申请号 JP20070087374 申请日期 2007.03.29
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 KAJINO KAZUKI;HOSOKAWA AKIHIRO;TERAJIMA KOZO
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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