| 摘要 |
A plasma processing apparatus includes a vacuum vessel, first, second and third power supplies first, second and third RF voltages, a first electrode disposed within the vacuum vessel, a second electrode disposed within the vacuum vessel, and a phase control unit for controlling the phase difference of the second and third RF voltages, wherein the second and third RF voltages are of the same frequency. The apparatus further comprises a first phase detector for detecting the phase of the third RF voltage supplied to the first electrode and a second phase detector for detecting the phase of the second RF voltage of the second electrode, a voltage detector, and a phase difference computer which computes a phase difference between the second and third RF voltages based upon an output of the voltage detector.
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