METHOD TO FORM A PATTERN OF FUNCTIONAL MATERIAL ON A SUBSTRATE USING A MASK MATERIAL
摘要
<p>The invention provides a method to form a pattern (55) of functional material (46) on a substrate (34) for use in electronic devices and components. The method uses a stamp having a relief structure to transfer a mask material (32) to a substrate (34) and form a pattern of open area (42) on the substrate (34). The functional material (46) is applied to the substrate (34) in at least the open area (42). Contact of an adhesive material (52) to an exterior surface (56) opposite the substrate (34) and separation of the adhesive from the substrate forms the pattern (55) of functional material (46) on the substrate (34). The method is- suitable for the fabrication of microcircuitry for electronic devices and components.,</p>
申请公布号
WO2008124130(A1)
申请公布日期
2008.10.16
申请号
WO2008US04510
申请日期
2008.04.07
申请人
E. I. DU PONT DE NEMOURS AND COMPANY;BLANCHET, GRACIELA, BEATRIZ;LEE, HEE, HYUN