发明名称 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE TRANSFER MATERIAL, LIGHT SHIELDING FILM FOR DISPLAY DEVICE AND ITS MANUFACTURING METHOD, SUBSTRATE WITH LIGHT SHIELDING FILM, LIQUID CRYSTAL DISPLAY ELEMENT, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition stably forming a desired pattern profile without being influenced by fluctuation in the temperature condition during manufacture, and to provide a photosensitive transfer material using the composition, a light shielding film for a display device formed by using the photosensitive resin composition or the photosensitive transfer material, a method for manufacturing the film, a substrate with a light shielding film having the light shielding film for a display device, and a liquid crystal display element and a liquid crystal display device having a substrate with a light shielding film and capable of displaying an image with a high contrast. <P>SOLUTION: The photosensitive resin composition contains a resin having a glass transition temperature of &le;70&deg;C and metal particles; and the photosensitive transfer material uses the above composition. The photosensitive resin composition or the photosensitive transfer material is used for a light shielding film for a display device and a method for manufacturing the film. The substrate with a light shielding film has the light shielding film for a display device. The liquid crystal display element and the liquid crystal display device have the substrate with a light shielding film. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008249868(A) 申请公布日期 2008.10.16
申请号 JP20070089035 申请日期 2007.03.29
申请人 FUJIFILM CORP 发明人 HOSOKAWA TAKASHI;YOSHIMURA KOSAKU;MIYAKE KAZUHITO
分类号 G03F7/033;G02B5/00;G02B5/20;G02F1/1335;G03F7/004 主分类号 G03F7/033
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