PLASMA GENERATION DEVICE AND PLASMA FILM-MAKING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a plasma generation device and plasma film-making device having fewer impedance matching units than antenna elements have and having a relatively compact impedance matching mechanism.

SOLUTION: The plasma generation device comprises an impedance matching member 26 connected with a power supply line 27 supplying a high-frequency signal to a plurality of antenna elements 22 and having a variable specific parameter for matching impedance, a distribution wiring 40 arranged in response to the impedance matching member 26 and connecting the impedance matching member 26 to at least two or more of antenna elements 22, and control unit 30 simultaneously changing impedance matching conditions of at least two or more of antenna elements 22 connected with the impedance matching members via the distribution wiring 40 by changing the specific parameter of the impedance matching member 26.

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