发明名称 ALIGNMENT FOR IMPRINT LITHOGRAPHY
摘要 <p>A method of aligning an imprint template with respect to a target region of a substrate is disclosed, the method including depositing a volume of an imprintable medium within the target region; contacting an imprint template to the imprintable medium so that the imprintable medium is compressed and allowing the imprint template, the target region, or both, to move laterally with respect to each other under interfacial tension forces between the target region and the imprint template, wherein a material which is less wetting than the substrate is provided in a configuration which at least partially surrounds the target region of the substrate.</p>
申请公布号 KR100863796(B1) 申请公布日期 2008.10.16
申请号 KR20060131244 申请日期 2006.12.20
申请人 发明人
分类号 H01L21/027 主分类号 H01L21/027
代理机构 代理人
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