| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified resist composition having high sensitivity and high resolution, in which generation of stationary waves is suppressed and a rectangle profile can be obtained even when a high reflective substrate is used as it is without using an antireflection film, and to provide a method for forming a pattern by using the composition. <P>SOLUTION: The positive resist composition contains: a resin having such properties that the resin is insoluble or hardly soluble with at least two kinds of alkali developer solutions and becomes soluble to an alkali developer solution by action of an acid, in which at least one kind of resin has a specified repeating unit having a group showing absorption at 248 nm in a side chain; and further contains a compound generating an acid by irradiation with actinic rays or radiation; and an organic basic compound. The method for forming a pattern is carried out by using the above composition. <P>COPYRIGHT: (C)2009,JPO&INPIT |
