| 摘要 |
PROBLEM TO BE SOLVED: To provide substrate treatment equipment that can always discharge process liquid under certain conditions irrespectively of a discharge position and controls upsizing of the equipment. SOLUTION: Three resist application processing units SC1 to SC3 are laminated and arranged in a perpendicular direction that discharge photo-resist onto a substrate to do resist processing. A discharge unit LT2 integrates a trap tank 64 that stores resist supplied from a chemical bottle 71, a discharge nozzle 61 for discharging resist, and a discharge pump 63 for pumping the resist from the discharge nozzle 61 for discharging resist and the trap tank 64 to the discharge nozzle 61, thus going up and down in a vertical direction while moving among the resist application processing units SC1 to SC3. The mutual distance and vertical interval of the trap tank 64, the discharge pump 63, and the discharge nozzle 61 are constant despite the height position of the discharge unit LT2, and the resist discharge conditions are always constant as well regardless of the height position of the discharge unit LT2. COPYRIGHT: (C)2009,JPO&INPIT
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