| 发明名称 |
PHOTOSENSITIVE POLYAMIC ACID ESTER COMPOSITION |
| 摘要 |
<p>A photosensitive polyamic acid ester composition characterized by comprising 100 parts by mass of a polyamic acid ester consisting only of repeating units represented by a specific skeleton, 1-40 parts by mass of a photoinitiator, 30-1,500 parts by mass of a solvent, and 0-150 parts by mass of a polyamic acid ester consisting only of specific repeating units.</p> |
| 申请公布号 |
WO2008123583(A1) |
申请公布日期 |
2008.10.16 |
| 申请号 |
WO2008JP56686 |
申请日期 |
2008.04.03 |
| 申请人 |
ASAHI KASEI EMD CORPORATION;TAMURA, NOBUCHIKA;NIWA, MOTOHIRO;MARUYAMA, KIMIYUKI |
发明人 |
TAMURA, NOBUCHIKA;NIWA, MOTOHIRO;MARUYAMA, KIMIYUKI |
| 分类号 |
C08G73/12;G03F7/004;G03F7/40;H01L21/027;C08F290/14;G03F7/027 |
主分类号 |
C08G73/12 |
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