OPTICAL METROLOGY USING A SUPPORT VECTOR MACHINE WITH SIMULATED DIFFRACTION SIGNAL INPUTS

摘要

An optical metrology using a support vector machine with simulated diffraction signal inputs is provided to improve a calculation speed by employing a series of values with respect to a profile parameter to generate a simulated diffraction signal. A profile model of a structure is obtained(202). The profile model is defined by a profile parameter which specifies a geometric feature of the structure. A series of values with respect to the profile parameter are obtained(204). A simulated diffraction signal is generated by using the series of values with respect to the profile parameter(206). The simulated diffraction signal specifies the behavior of a diffracted light from the structure. A support vector machine is trained by the series of values as an estimated output(208). A diffraction signal measured from the structure is obtained(210). The measured diffraction signal is inputted into the trained support vector machine(212). A profile parameter of the structure is obtained as the output of the trained support vector machine(214).