| 摘要 |
PROBLEM TO BE SOLVED: To provide an electrode for plasma treatment apparatus, which has electrical characteristics that can preferably be used for an electrode of a plasma treatment apparatus and can generate a plasma with stability over a long term. SOLUTION: The electrode for plasma treatment apparatus is placed in a plasma treatment apparatus and generates the plasma in a plasma generating vessel with a high-frequency voltage applied, and its surface part exposed at least to the plasma is made of SiC, generated by a chemical vapor deposition method, where the impurity concentration range of SiC is 3.0×10<SP>15</SP>pieces/cm<SP>3</SP>to 1.0×10<SP>19</SP>pieces/cm<SP>3</SP>. COPYRIGHT: (C)2009,JPO&INPIT
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