发明名称 POLYESTER FILM FOR LIQUID RESIST PHOTOMASK PROTECTIVE TAPE
摘要 PROBLEM TO BE SOLVED: To provide a polyester film for liquid resist photomask protective tape, such that production of internal foreign matter and oligomer of a protection tape base material is very small. SOLUTION: A biaxially-oriented polyester film for liquid resist photomask protective tape which has a surface resistivity of 1.0×10<SP>13</SP>Ω/square, the biaxially aligned polyester film containing a titanium compound and a phosphorus compound by amounts, such that expressions (1) 0<W<SB>TI</SB>≤20 and (2) 1≤W<SB>P</SB>≤300 (where W<SB>TI</SB>is the content (ppm) of titanium elements in the polyester film, and W<SB>P</SB>is the content (ppm) of phosphorus elements in the polyester film) are satisfied, at the same time, and the content of an antimony element is 10 ppm or lower. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008251920(A) 申请公布日期 2008.10.16
申请号 JP20070092634 申请日期 2007.03.30
申请人 MITSUBISHI PLASTICS IND LTD 发明人 SUZUKI TAKASHI
分类号 H05K3/28 主分类号 H05K3/28
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