发明名称 HIGHLY SMOOTH GAS BARRIER FILM AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a highly smooth gas barrier film excellent in surface smoothness, gas barrier properties and adhesion, and its manufacturing method. SOLUTION: The highly smooth gas barrier film is constituted by laminating a highly smooth layer, an intermediate layer and a gas barrier layer on a film base material in this order. The intermediate layer is formed by producing a plasma forming gas in the periphery of the film base material by impressing high frequency power to the film base material to form plasma and laminated by sputtering a target material while impressing negative DC high voltage to the film base material. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008246893(A) 申请公布日期 2008.10.16
申请号 JP20070092003 申请日期 2007.03.30
申请人 LINTEC CORP 发明人 NAGANAWA TOMOHITO;HOSHI SHINICHI;OKUCHI SHIGETO;SEKIYA MASAHIKO
分类号 B32B9/00;C23C14/20;H01L51/50;H05B33/04 主分类号 B32B9/00
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