EXPOSURE METHOD, EXPOSURE APPARATUS, LIGHT CONVERGING PATTERN FORMATION MEMBER, MASK, AND DEVICE MANUFACTURING METHOD

摘要

An exposure method includes a first exposure step of irradiating a mask (10), which is arranged near a plate (P), with exposure light and exposing a predetermined pattern formed on the mask onto a plate; and a second exposure step of irradiating a light converging pattern formation member (20), which is arranged near the plate and includes a plurality of light converging portions (20a, 20b), with exposure light and exposing a light converging pattern having a predetermined shape onto the plate. At least part of the predetermined pattern exposed onto the plate in the first exposure step and at least part of the light converging pattern formed on the plate in the second exposure step overlap each other.