| 摘要 |
PROBLEM TO BE SOLVED: To provide a processor and a processing method for preventing influence on a transfer chamber of radiated heat by shielding the radiated heat to the transfer chamber from each processing unit when a gate valve is opened. SOLUTION: A shutter mechanism 40 is maintained in the state with the gate valve G closed. When a process is being executed in each unit 1 to 4, it is maintained in the state with the gate valve G opened. When a semiconductor substrate W is carried in or carried out to or from the processing unit 1 to 4 with the transfer device 12, the gate valve G is intermediately closed leaving a gap to allow carry-in or carry-out of the semiconductor wafer W, namely the gate valve G is maintained to be open. This gate valve is controlled to be perfectly closed for preparation for exchange of the semiconductor wafer W in the transfer device 12. COPYRIGHT: (C)2009,JPO&INPIT
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