| 摘要 |
PROBLEM TO BE SOLVED: To drastically reduce the consumption of a raw material gas when depositing metal copper on a substrate by chemical reaction of the raw material gas by supplying the metal raw material complex, for example, gaseous copper acetate, obtained by sublimating a solid raw material to the substrate as the raw material gas. SOLUTION: The deposition is performed by supplying the raw material gas obtained by sublimating the solid raw material in a treatment vessel, adsorbing the raw material as a solid on the adsorption and desorption member within the treatment vessel, then stopping the supply and exhaust of the raw material gas and generating as hermetic space in the treatment vessel, then heating the substrate to desorb the raw material from the adsorption and desorption member, and causing the raw material to make chemical reaction on the substrate. COPYRIGHT: (C)2009,JPO&INPIT
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