| 摘要 |
PROBLEM TO BE SOLVED: To suppress the contamination of a substrate due to inflow of gases, such as gaseous oxygen, gaseous nitrogen, moisture and organic matter from the outside in performing deposition to and transfer to the substrate under a vacuum atmosphere. SOLUTION: The gases flowing into the vacuum vessel are captured by disposing a capture object for capturing the gases in a region verging on a sealing area for a sealing member itself or the sealing member from which the region verging on the sealing member can look over from the surface of the substrate on an installation part in the area sealing the members constituting the vacuum vessel to each other. COPYRIGHT: (C)2009,JPO&INPIT
|
