发明名称 UNDERWATER PLASMA PROCESSING APPARATUS AND SYSTEM AND METHOD FOR PROCESSING BALLAST WATER OF SHIP USING THE SAME
摘要 <p>There is provided an underwater pulse plasma processing apparatus including: a power supply unit for generating pulse power; at least one discharge unit for discharging the pulse power generated in the power supply unit to a water surface including an air layer or to water including air bubbles; and a plasma processing unit for removing underwater microorganisms through plasma generated by the at least one discharge device.</p>
申请公布号 WO2008123749(A1) 申请公布日期 2008.10.16
申请号 WO2008KR02010 申请日期 2008.04.10
申请人 21C SHIPBUILDING CO., LTD.;RYU, HAN-SEONG;HA, YEON-CHUL;SEO, DONG-HYEOK;KIM, DONG-EUN;YOUN, HYEOK-JOON 发明人 RYU, HAN-SEONG;HA, YEON-CHUL;SEO, DONG-HYEOK;KIM, DONG-EUN;YOUN, HYEOK-JOON
分类号 C02F1/30 主分类号 C02F1/30
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