发明名称 PHOTOSENSITIVE RESIN COMPOSITION FOR IMAGE FORMATION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for image formation which enables to have both alkali developability and photocurability, and enables to obtain a cured product which is excellent in dimensional stability against temperature change and does not exhibit brittleness. <P>SOLUTION: The photosensitive resin composition for image formation capable of forming an alkali developable film contains an acid-modified vinyl ester which is synthesized from a bifunctional epoxy compound, a bifunctional phenol compound, an unsaturated monobasic acid and/or an unsaturated monomer having a functional group capable of reacting with a phenolic hydroxyl group, and a polybasic acid anhydride, wherein at least a part of the bifunctional epoxy compound or the bifunctional phenol compound has a biphenyl skeleton. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008250307(A) 申请公布日期 2008.10.16
申请号 JP20080052447 申请日期 2008.03.03
申请人 NIPPON SHOKUBAI CO LTD 发明人 OTSUKI NOBUAKI
分类号 G03F7/027;G03F7/004 主分类号 G03F7/027
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