| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generator where, in a plasma gun, without reducing the effective amount of plasma generated by vacuum arc discharge, droplets intruding into the plasma can be efficiently removed, further, droplet removal parts can be easily and inexpensively composed, and the improvement in the precision of surface treatment such as film deposition by high purity plasma can be attained. <P>SOLUTION: In the plasma generator, the circumference of a plasma gun cathode 407 is surrounded by an enclosure member 420, and the inside of the enclosure member 420 is provided with a droplet removal apparatus 406 composed of a plurality of collecting members 411 collecting droplets, so as to be a multilayer shape. The enclosure member 420, the collecting members 411 and a plasma progression path 402 have no connected relation with an arc source 409, and are held to an electrically neutral floating state. <P>COPYRIGHT: (C)2009,JPO&INPIT |
