| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To downsize a clean room in which a semiconductor manufacturing equipment or a liquid crystal manufacturing equipment is installed. <P>SOLUTION: The apparatus for treating perfluoro compounds comprises a device 9 for decomposing the perfluoro compounds having a catalyst layer 17 provided therein and into which an exhaust gas containing the perfluoro compounds is introduced to decompose the perfluoro compounds, and a device 22 for removing acidic compounds which removes first reaction products produced by reacting the acidic compounds contained in the exhaust gas exhausted from the device 9 for decomposing the perfluoro compounds with a calcium salt. A clean room 2 can be downsized since a space for installing the PFC decomposing device 9 is not necessary to be secured in the clean room 2 in which the semiconductor manufacturing equipment or the liquid crystal manufacturing equipment is installed. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
