发明名称 RESISTOR STRUCTURE AND FABRICATING METHOD THEREOF
摘要 A resistor structure includes a substrate, a well of a predetermined conductive type positioned in the substrate, a gate structure positioned on the substrate, a first doping region of the predetermined conductive type positioned at a first side of the gate structure, a second doping region of the predetermined conductive type positioned at a second side of the gate structure. The predetermined conductive type can be P type or N type. A fabricating process of the resistor can be integrated into a conventional MOS transistor fabricating process. Moreover, the resistor has better heat dissipation than conventional resistors.
申请公布号 US2008252410(A1) 申请公布日期 2008.10.16
申请号 US20070735503 申请日期 2007.04.16
申请人 LIN HUNG-SUNG 发明人 LIN HUNG-SUNG
分类号 H01C7/10;H01L21/62;H01L29/10 主分类号 H01C7/10
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