| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photo base generating agent which has photoreaction activity in a wavelength region of ≥400 nm, and to provide a photosensitive resin composition which is highly sensitive and gives high solubility contrast without relating to the kinds of polymer precursors. <P>SOLUTION: Provided is this photo base generating agent represented by formulas (1A) to (1C), and the photosensitive resin composition comprising the photo base generating agent and a polymer precursor. Therein, R<SP>a</SP>and R<SP>b</SP>are each independently H, a halogen atom, hydroxy, mercapto, nitro, silyl, silanol, or a monovalent organic group; R<SP>c</SP>groups are each independently H, or a monovalent organic group, provided that at least one of R<SP>c</SP>groups is the monovalent organic group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
