发明名称 OXIME SULFONIC ACID COMPOUND AND PHOTOSENSITIVE COMPOSITION BY USING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide an oxime sulfonic acid ester as an acid-forming agent, excellent in preservation stability, and by using the acid-forming agent, also a photosensitive composition extremely excellent in preservation stability. <P>SOLUTION: This oxime sulfonic acid compound characterized by being expressed by general formula (1) [wherein, R<SP>1</SP>is any of an alkyl, an aryl or a heteroaromatic group which may have a substituent; Ar is an aromatic or a heteroaromatic group which may have a substituent; X is any of O and S: and A is preferably any of the forms of 5 and 6-membered rings] and a photosensitive composition by using the same are provided. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008247780(A) 申请公布日期 2008.10.16
申请号 JP20070089738 申请日期 2007.03.29
申请人 FUJIFILM CORP 发明人 FUJITA AKINORI;TAKAYANAGI TAKASHI
分类号 C07D307/92;C07D333/74;G03F7/004;G03F7/039;H01L21/027 主分类号 C07D307/92
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