发明名称 METHOD FOR DEPOSITION OF (Al,In,Ga,B)N
摘要 A method for growing an improved quality nitride thin film on a patterned substrate is disclosed, wherein the nitride film is grown at atmospheric pressure. A nitride template is disclosed, comprising a patterned substrate and a one or more nitride layer direct growth off of the patterned substrate, comprising no lateral epitaxial overgrowth regions and a substantially coalesced surface smooth enough for subsequent deposition of light emitting device quality nitride layers onto the surface. A light emitting diode comprising the nitride film is also disclosed.
申请公布号 US2008251802(A1) 申请公布日期 2008.10.16
申请号 US20080102612 申请日期 2008.04.14
申请人 THE REGENTS OF THE UNIVERSITY OF CALIFORNIA 发明人 IZA MICHAEL;DENBAARS STEVEN P.;NAKAMURA SHUJI
分类号 H01L21/00;H01L33/00 主分类号 H01L21/00
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