SUBSTRATE SUPPORTER AND APPARATUS FOR PLASMA TREATMENT HAVING IT

摘要

A substrate supporter and a plasma process apparatus having the same are provided to secure stable reception of a substrate by reducing the generation possibility of arc discharge. At least one arm(21) receives a substrate(50). A supporting unit is extended to a position of the substrate receiving position. The supporting unit is formed with a supporting ring(22) that connects the arms. The supporting ring is formed to make an open contour. An auxiliary ring(22') is arranged on an opening of the open contour of the supporting ring. An auxiliary arm(21') is connected to the auxiliary ring. The auxiliary arm is formed to the same direction as the arm or the different direction. The auxiliary arm is individually driven with the arm. The supporting ring has plural supporting pins(23) that are extended to the substrate receiving direction. The supporting ring has a step where a slope is formed to the substrate direction. The supporting pin is formed on a lower portion of the step.