发明名称 APPARATUS FOR ETCHING
摘要 An etching apparatus is provided to obtain different circuit patters at upper and lower sides of a PCB(Printed Circuit Board) and form fine circuits, using different etching liquids from two etching liquid concentration controllers. An etching apparatus comprises etching tanks(104,106), a post etching tank(108), first, second, and third etching tanks(102a,102b,102c), a flooded water tank(112), a hydrochloric acid tank(114), and first and second etching liquid concentration controllers(110a,110b). The etching tanks etch upper and lower sides of a PCB(Printed Circuit Board) by first and second etching liquids. The post etching tank flats the upper and lower surfaces of the PCB by the first and second etching liquids. The first etching tank receives and stores a mixed etching liquid of the first and second etching liquids. The second etching tank stores the first etching liquid. The third etching tank stores the second etching liquid. The first etching liquid concentration controller detects/controls concentration of the first etching liquid. The second etching liquid concentration controller detects/controls concentration of the second etching liquid.
申请公布号 KR20080092782(A) 申请公布日期 2008.10.16
申请号 KR20070036614 申请日期 2007.04.13
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK, KI WON;KIM, MIN SOO;PARK, YOUNG GEUN
分类号 C23F1/00 主分类号 C23F1/00
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