发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR MEMORY DEVICE, METHOD FOR REGENERATING SEMICONDUCTOR MEMORY DEVICE, AND METHOD FOR RESHIPPING SEMICONDUCTOR DEVICE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor memory device which prevents degradation of charge retention characteristic even if repeating writing and erasing of information data. <P>SOLUTION: The method for manufacturing the semiconductor memory device which is formed on a semiconductor substrate by a plurality of memory cells in FET structures, and stores information data by storing a unit bit in each of a plurality of the memory cells, prepares a plurality of the memory cells, writes each bit of the information data into each memory cell, leaves each memory cell for a preset time under a prescribed ambient temperature after writing each bit of the information data into each memory cell, and after that writes each bit of the information data again. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2008251098(A) 申请公布日期 2008.10.16
申请号 JP20070091929 申请日期 2007.03.30
申请人 OKI ELECTRIC IND CO LTD 发明人 FUJII NARIHISA
分类号 G11C16/02;G11C17/00;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 主分类号 G11C16/02
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