摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor memory device which prevents degradation of charge retention characteristic even if repeating writing and erasing of information data. <P>SOLUTION: The method for manufacturing the semiconductor memory device which is formed on a semiconductor substrate by a plurality of memory cells in FET structures, and stores information data by storing a unit bit in each of a plurality of the memory cells, prepares a plurality of the memory cells, writes each bit of the information data into each memory cell, leaves each memory cell for a preset time under a prescribed ambient temperature after writing each bit of the information data into each memory cell, and after that writes each bit of the information data again. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |