发明名称 Laser lithography system with improved bandwidth control
摘要 A method and apparatus may comprise a seed laser, along with an amplifier laser amplifying the output of the seed laser. A bandwidth metrology module may provide a bandwidth measurement and a bandwidth error signal may be provided using a bandwidth set point. A differential timing system responsive to the error signal can selectively adjust a differential firing time between the seed laser and amplifier laser. A beam dimension and center wavelength control system may adjust a beam dimension, within the cavity of the seed laser, to select bandwidth, and may adjust center wavelength at the same time, using a plurality of beam expansion prisms and at least one other prism or other optical element in the cavity to select center wavelength.
申请公布号 US2008253413(A1) 申请公布日期 2008.10.16
申请号 US20080082301 申请日期 2008.04.09
申请人 CYMER, INC. 发明人 PARTLO WILLIAM N.
分类号 H01S3/13 主分类号 H01S3/13
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