发明名称 PHOTOSENSITIVE ADHESIVE COMPOSITION, FILM-LIKE ADHESIVE, ADHESIVE SHEET, ADHESIVE PATTERN, SEMICONDUCTOR WAFER WITH ADHESIVE LAYER, SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
摘要 <p>A photosensitive adhesive composition contains (A) an alkali-soluble resin, (B) an epoxy resin, (C) a radioactive polymerizable compound and (D) a photosensitive adhesive compound containing a photo initiator. The photo initiator (D) contains a photo initiator which has a function of promoting reaction of polymerization and/or curing of the epoxy resin by at least irradiation of a radioactive ray (D1).</p>
申请公布号 WO2008123110(A1) 申请公布日期 2008.10.16
申请号 WO2008JP55124 申请日期 2008.03.19
申请人 HITACHI CHEMICAL COMPANY, LTD.;MITSUKURA, KAZUYUKI;KAWAMORI, TAKASHI;MASUKO, TAKASHI;KATOGI, SHIGEKI 发明人 MITSUKURA, KAZUYUKI;KAWAMORI, TAKASHI;MASUKO, TAKASHI;KATOGI, SHIGEKI
分类号 C09J179/08;C08L63/00;C09J4/00;C09J7/02;C09J11/06;C09J163/00;H01L21/301;H01L21/52 主分类号 C09J179/08
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