METHOD FOR MAKING LENS FEATURES

摘要

A process describes a combined use of anisotropic dry etching and isotropic wet etching to produce features. The mask protecting material (301) to be etched is exposed through lithography. An anisotropic dry etch is used to generate a trench through the hole (303). The depth of this etch will increase the overall lenslet aspect ratio which is generated in the next, wet etch.