PHOTOMASK FOR PROXIMITY EXPOSURE, AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a photomask for proximity exposure capable of forming a fine pattern by proximity exposure, and to provide a method for manufacturing the photomask for proximity exposure.

SOLUTION: The photomask for proximity exposure includes: a transparent substrate; a light blocking part formed on the transparent substrate in a pattern-like manner; and a transmitted light adjusting part formed in a manner to coat an opening part sectioned by the light blocking part, and the edge region of the light blocking part that composes the opening part. The surface shape of the cross section of the transmitted light adjusting part is of a linear fashion in parallel with the transparent substrate in the central part of the opening part, and is of the shape to refract the transmitted light to the central part side of the opening part at least on the edge region of the light blocking part.

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