发明名称 MANUFACTURING METHOD OF POLISHING PAD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing a long polishing pad having no joints and a method for productively manufacturing a polishing pad which can prevent slurry leakage from between a polishing region and a light transmission region. <P>SOLUTION: A cylindrical resin block 1 comprises cylindrical polishing regions 2, 4, and cylindrical light transmission regions 3, which are laminated. The manufacturing method comprises fabricating the cylindrical resin block obtained by laminating the cylindrical polishing regions and the cylindrical light transmission regions, and fabricating belt-like resin sheets 7 by rotating the resin block around the axis 5 thereof and slicing the surface portion of the resin block into a predetermined thickness. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2008251915(A) 申请公布日期 2008.10.16
申请号 JP20070092562 申请日期 2007.03.30
申请人 TOYO TIRE & RUBBER CO LTD 发明人 KIMURA TAKESHI;OGAWA KAZUYUKI;KAZUNO ATSUSHI;SHIMOMURA TETSUO;NAKAI YOSHIYUKI
分类号 H01L21/304;B24B37/013;B24B37/20 主分类号 H01L21/304
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