| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resist composition for color filter with which a thin film pattern having high light shielding property can be easily formed by a photolithographic process, the residue in an unexposed part after alkali development can be suppressed and a favorable pattern profile and sensitivity are obtained, and to improve reliability and manufacturing yield of a color filter and a liquid crystal display device. <P>SOLUTION: The photosensitive resist composition comprises at least a pigment (A), an acrylic polymer (B), a monomer (C), a photopolymerization initiator (D) and a solvent (E), wherein the monomer (C) comprises a bisphenolfluorene type acrylate and/or a diacrylate of bisphenol-A epoxy resin. <P>COPYRIGHT: (C)2009,JPO&INPIT |
