| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for image formation which enables to have both alkali developability and photocurability, and enables to obtain a cured product which is excellent in dimensional stability against temperature change and does not exhibit brittleness. <P>SOLUTION: The photosensitive resin composition for image formation contains an acid-modified vinyl ester which is synthesized from an epoxy compound, a phenol compound, an unsaturated monobasic acid and a polybasic acid anhydride, while using a crystalline epoxy resin having a melting point of ≥90°C as at least a part of the epoxy compound and using a compound having a bisphenol S skeleton as at least a part of the phenol compound. <P>COPYRIGHT: (C)2009,JPO&INPIT |
