| 发明名称 |
SUBSTRATE TRANSPORTING APPARATUS AND METHOD, EXPOSURE APPARATUS AND METHOD, AND DEVICE PRODUCING METHOD |
| 摘要 |
A substrate transport apparatus, which transports a substrate that has been exposed with an image of a pattern through a projection optical system and a liquid, comprises a substrate support member that supports the substrate, and a liquid removal mechanism that removes the liquid that has adhered to at least one of the substrate support member and at least a portion of the area of the rear surface of the substrate. |
| 申请公布号 |
EP1672682(A4) |
申请公布日期 |
2008.10.15 |
| 申请号 |
EP20040792214 |
申请日期 |
2004.10.08 |
| 申请人 |
ZAO NIKON CO., LTD.;NIKON CORPORATION |
发明人 |
TANNO, NOBUYOSHI;HORIUCHI, TAKASHI |
| 分类号 |
G03F7/20;B65G49/07;H01L21/00;H01L21/027;H01L21/68;H01L21/687 |
主分类号 |
G03F7/20 |
| 代理机构 |
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